Kwame Eason

Kwame Eason

Summary

Strongest Attributes: Problem Solver: Ability to diagnosis and triage hardware and software issues on complex systems, often where the distinction in the two is not obvious. Successful track record, travelled extensively worldwide to resolve application and hardware issues, for both optical and non-contact electrical metrology tools. Innovator: Ability to integrate theoretical (academic) and practical experience to introduce new capabilities, as evidenced by five patent submissions on FEOL process development, metrology, and process integration. Also worked with customers and engineering teams to define, design and implement new capabilities on complex metrology tools. Educator / Presenter: Ability to present technically dense material in a more generally understandable manner. Ability to interpret large volumes of data, extract trends and present a clear, concise and cohesive message, as evidenced by over 10 peer reviewed publications. Extensively travelled in order to educate on computational electro-dynamics, minimization algorithms, Corona-Oxide-Semiconductor systems and their applications to front-end processing. Team Builder / Manager: Ability to work effectively and efficiently in a matrix organization, often having responsibility for project deliverables, without having direct manager authority over key players. Directly managed teams of up to 4 people.

Work History

Work History
Aug 2007 - Feb 2009

Member Technical Staff, Advanced Process Development

Member Technical Staff – Front End Diffusion • Optimized ONO nitride for NAND Flash Process, using Kokasai ALD tool set. • Demonstrated Plasma Nitridation for EOT reduction, including optimizing process integration. • ONO stack final EOT model building from in-line metrology, cross referenced with optical, electrical (SDI), XRR, and TEM. Model successfully predicts final EOT with in 1A. • Using Design of Experiments (DOE), characterized ALD Silicon Rich Nitride process space for uniformity, thickness and composition. • Implemented in-line electrical and optical metrology techniques to rapidly screen process space, predict end of line behavior, and shorten learning cycles. • Lead team on scatterometry benchmarking project (w/ 6 vendors) and internal tool evaluation. • Successfully demonstrated scatterometry process control for 4 etch applications (NOR and NAND). • Prolific IP generator: 4 patent submissions on flash process, integration and metrology.
Aug 2000 - Jul 2007

Applications Development Engineer

KLA-Tencor Corporation: San Jose, CA

Project Manager – Integrated Optical Critical Dimension Metrology Tool

·Directly responsible for successful implementation of following operations: manufacturing, marketing, product engineering (HW and SW), and service / support (ie Reliability).

·Successfully managed schedules and resources in globally matrix organization:

Manufacturing in US and Israel; SW development in Israel, India, US and Russia; alpha test site is US and customers in Europe and Asia.

·Work closely with cross functional teams in matrix organization to define and implement product requirements, feature sets and competitive trade-offs.

·Managed OEM partner relationships.

·Managed products through various phases of the Product Life Cycle.

·Developed and supported integrated optical CD.Managed on-site field apps and field service for 3 integrated metrology accounts.

·Successfully introduced several options and upgrades by serving as customer beta site manager.

Technical and Product Marketing(Optical and Electrical Metrology)

·Develop technical product collateral highlighting product capability and positioning

·Work closely with cross functional teams in matrix organization to define and implement product requirements, feature sets and competitive trade-offs.

·Developed business plan and MRD for next generation Electrical Characterization Tool and conducted market validation at 7 top IC customer sites, resulting in financial commitment from company to productize.

Applications Development and Systems Engineering (Optical and Electrical Metrology)

·Expert in trouble shooting complex systems.

·Provided and supported training on scatterometry and electrical characterization to all levels of technical detail.

·Published 6 technical papers in collaboration with industry partners

·Developed and supported gate applications on integrated optical CD.

·Retired customer escalations in a cross functional, internationally resource distributed environment.

·Characterized, enhanced, and optimized Optical Critical Dimension dedicated production tool system including alignment optimization, MAM time reduction and throughput improvements.

·Managed 4 Joint Development Programs focused on evaluating and implementing Quantox (Electrical Characterization) for gate dielectric electrical process control (High-k and nitrided gates).

·Developed gate dielectric and OCD Best Known Methods (BKMs) for high-volume production process control

Mar 1999 - Aug 2000

Semiconductor Process Development Engineer

Texas Instruments, Inc.: Dallas, TX
Semiconductor Process Development Engineer • Developed physical and electrical models for decoupled plasma nitridation, allowing for successful implementation of AMAT DPN films into high-volume manufacturing • Supported efforts for device scaling to future generation technology nodes • Evaluated alternated plasma nitridation methodologies for process robustness (i.e. wafer uniformity, gate leakage reduction, chamber stability, dielectric metal and elemental contamination) • Involved in reliability characterization of ultra-thin gate dielectric films • Contributor to patent application for optimizing dielectric reliability via controlling nitrogen profiling

Education

Education
1997 - 2000

Ph.D

Stanford University
Thesis Topic: “Optimization of Pre-Gate Cleaning Sequences and Alternate Gate dielectrics”. The research involves process optimization of MOSFET fabrication, with regard to interfacial surface roughness and nitridation of gate oxides. Advisor: Dr. C. R. Helms
1994 - 1997

MS

Stanford University
My optical experience spans academic, laboratory, and high volume manufacturing via Stanford (MSEE), Bell Labs (2 internships), and Lucent (metrology support). I worked on fiber optics, optical amplifiers, conventional horizontal and vertical cavity surface emitting lasers and have expertise in SPC, DOE, failure analysis and metrology. I have 3 years of opto-electronic research and development experience.

Skills

Skills

Problem Solver / Trouble Shooter

Ability to diagnosis and triage hardware and software issues on complex systems, often where the distinction in the two is not obvious.  Successful track record, travelled extensively worldwide to resolve application and hardware issues, for both optical and non-contact electrical metrology tools. 

Portfolio